Low voltage magnetron discharges for thin film preparation
- 1 January 1991
- Vol. 42 (1-2) , 39-41
- https://doi.org/10.1016/0042-207x(91)90074-s
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Film modification by low energy ion bombardment during depositionThin Solid Films, 1989
- Hollow-cathode-enhanced magnetron sputteringJournal of Vacuum Science & Technology A, 1986
- Angular distributions of sputtered atoms for low-energy heavy ions, medium ions and light ionsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986