Silylation of resist materials using di- and polyfunctional organosilicon compounds
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1) , 503-506
- https://doi.org/10.1016/0167-9317(90)90159-q
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The use of organosilicon polymers in multilayer plasma resist processingMicroelectronic Engineering, 1987
- Diazopolysiloxanes: Unique imageable barrier layersMicroelectronic Engineering, 1986
- Spectral Studies of HydroxytriazenesZeitschrift für Naturforschung B, 1965