On the relations between preparation, atomic parameters and macroscopic properties of metal-ceramic interfaces
- 1 January 1990
- Vol. 40 (1-2) , 33-37
- https://doi.org/10.1016/0042-207x(90)90113-d
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealingJournal of Applied Physics, 1988
- Cu deposition on Al2O3 and AlN surfaces: Electronic structure and bondingJournal of Applied Physics, 1987
- Coloured ANOF layers on aluminiumCrystal Research and Technology, 1987
- Application Fields of ANOF Layers and CompositesCrystal Research and Technology, 1986
- Interfacial phenomena in metal-ceramic systemsMaterials Chemistry and Physics, 1986
- A novel x-ray photoelectron spectroscopy study of the Al/SiO2 interfaceJournal of Applied Physics, 1985
- Process characteristics and parameters of Anodic Oxidation by spark discharge (ANOF)Crystal Research and Technology, 1984
- Structure and properties of ANOF LayersCrystal Research and Technology, 1984