Preparation and properties of MoSx films grown by d.c. magnetron sputtering
- 28 February 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 41 (1) , 127-134
- https://doi.org/10.1016/0257-8972(90)90136-z
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- Stoichiometry and friction properties of sputtered MoSx layersThin Solid Films, 1985
- Morphological and compositional properties of MoSe2 films prepared by r.f. magnetron sputteringThin Solid Films, 1984
- Sputtered MoS2 lubricant coating improvementsThin Solid Films, 1980
- Tribological properties of sputtered MoS2 films in relation to film morphologyThin Solid Films, 1980
- Non-stoichiometry of MoS2 phase prepared by sputteringPhilosophical Magazine Part B, 1978
- The structure and composition of rf reactively sputtered MoSx filmsJournal of Applied Physics, 1978