Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy
- 1 May 2000
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 158 (3-4) , 246-251
- https://doi.org/10.1016/s0169-4332(00)00024-6
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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