Sorbed water and intrinsic stress in composite TiO2-SiO2 films
- 15 July 1989
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 66 (2) , 807-812
- https://doi.org/10.1063/1.343501
Abstract
Water sorption and stress properties of mixed composition TiO2‐SiO2 thin films, formed by reactive evaporative codeposition, were studied. These properties were observed to depend on the composition, and also on the reactive gas pressure and annealing conditions. Process conditions to produce water‐free films were established. Detailed stress studies in vacuum and in ambient indicated that intrisic stress also depends on ambient conditions, with irreversible changes occurring during the initial exposure of the films to ambient. This induced opposite types of stress on TiO2‐ and SiO2‐rich films. These observations can be explained in terms of the structural and compositional properties of the films.This publication has 17 references indexed in Scilit:
- The cracking and decohesion of thin filmsJournal of Materials Research, 1988
- Optical properties of SiO_2–TiO_2 composite filmsApplied Optics, 1985
- Microstructure of vapor-deposited optical coatingsApplied Optics, 1984
- Fracture Toughness Anisotropy of Sodium β‐ AluminaJournal of the American Ceramic Society, 1983
- Microstructure of dielectric thin films formed by e-beam coevaporationJournal of Vacuum Science & Technology A, 1983
- Stress in porous thin films through absorption of polar molecules (and relevance to optical coatings)Journal of Physics D: Applied Physics, 1980
- Refractive index and packing density for MgF2 films: Correlation of temperature dependence with water sorptionThin Solid Films, 1975
- Effects of Structure, Composition, and Stress on the Laser Damage Threshold of Homogeneous and Inhomogeneous Single Films and MultilayersApplied Optics, 1973
- Correlation between film structure and sorption behaviour of vapour deposited ZnS, cryolite and MgF2 filmsThin Solid Films, 1972
- Refractive Indices of Evaporated Cerium Dioxide–Cerium Fluoride Films*Journal of the Optical Society of America, 1963