Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch x-ray lithography
- 1 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4) , 271-274
- https://doi.org/10.1016/0167-9317(93)90071-c
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Description of microstructures in LIGA-technologyMicroelectronic Engineering, 1991
- Resist technology for deep‐etch synchrotron radiation lithographyMakromolekulare Chemie. Macromolecular Symposia, 1989