Effect of thermal treatment on the Hall mobility in thin vanadium films
- 1 August 1969
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 4 (2) , R11-R13
- https://doi.org/10.1016/0040-6090(69)90049-2
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Temperature Coefficient of Resistance in Thin Vanadium FilmsJournal of Applied Physics, 1968
- Transport Properties of Sputtered Vanadium Dioxide Thin FilmsJournal of Applied Physics, 1968
- Electrical Conductivity and Hall Effect in Thin Vanadium FilmsJournal of Applied Physics, 1967
- Temperature Coefficients of Resistance of Metallic Films in the Temperature Range 25° to 600°CJournal of Applied Physics, 1959
- ON THE THEORY OF THE HALL EFFECTCanadian Journal of Physics, 1951
- A theory of the irreversible electrical resistance changes of metallic films evaporated in vacuumProceedings of the Physical Society, 1943