Theoretical description of dry laser cleaning
- 1 March 2003
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 208-209, 15-22
- https://doi.org/10.1016/s0169-4332(02)01278-3
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- DRY LASER CLEANING OF PARTICLES BY NANOSECOND PULSES: THEORYPublished by World Scientific Pub Co Pte Ltd ,2002
- Resonance and steep fronts effects in nanosecond dry laser cleaningApplied Surface Science, 2002
- Dynamic particle removal by nanosecond dry laser cleaning: theoryPublished by SPIE-Intl Soc Optical Eng ,2002
- New mechanism of laser dry cleaningPublished by SPIE-Intl Soc Optical Eng ,2001
- Thermomechanical mechanisms of laser cleaningPublished by SPIE-Intl Soc Optical Eng ,2000
- Laser Processing and ChemistryPublished by Springer Nature ,2000
- Surface acceleration during dry laser cleaning of siliconApplied Physics A, 1999
- An energy approach to the modelling of particle removal by pulsed laser irradiationApplied Physics A, 1999
- Laser-assisted removal of particles on silicon wafersJournal of Applied Physics, 1999
- A theoretical model for laser removal of particles from solid surfacesApplied Physics A, 1997