Study of radiation stability in SiN x-ray mask membranes for synchrotron radiation lithography
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1) , 185-188
- https://doi.org/10.1016/0167-9317(92)90038-s
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- X-ray mask distortion due to radiation damageMicroelectronic Engineering, 1991
- Development of centrally controlled synchrotron radiation lithography beamline systemJournal of Vacuum Science & Technology B, 1990
- Influence of Oxygen upon Radiation Durability of SiN X-ray Mask MembranesJapanese Journal of Applied Physics, 1990