Donor-polarizability enhancement as the insulator-metal transition is approached from the insulating side
- 15 April 1980
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 21 (8) , 3523-3538
- https://doi.org/10.1103/physrevb.21.3523
Abstract
The low-temperature static dielectric constant for -type semiconductors shows a significant upward deviation from Clausius-Mossotti behavior as the donor concentration approaches the critical value for the onset of metallic behavior. After reviewing the possible reasons for this upward deviation and the various types of screening applied to the insulator-metal problem, a new continuum-model calculation of the donor-polarizability enhancement is presented which is based on an electrostatic donor-donor interaction potential and the Clausius-Mossotti relationship for the long-wavelength static dielectric constant . The Hassé variational approach is employed to calculate . The calculated enhancement contains two contributions: (1) a size effect associated with an enlargement of the donor wave function with , and (2) an increase in the average effective dielectric constant with seen by the localized donor wave function. The results show ranging from about 2 for Si:Sb to about 3 for Si:As. Comparison with the experimental data for Si:As shows the calculated upward deviation from Clausius-Mossotti behavior remains smaller than the data. The values of [based on a polarization catastrophe, a new self-consistent Clausius-Mossotti relationship, and a self-consistent Herzfeld criterion for from ] are between 60% and 100% larger than the experimental values for the silicon shallow donors. Possible corrections to this calculation resulting from the donor randomness, charge transfer, and corrections to the Lorentz-Lorenz local field are also discussed.
Keywords
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