Electrodeposition of thin yttria-stabilized zirconia layers using glow-discharge plasma

Abstract
A novel process for preparation of thin yttria‐stabilized zirconia (YSZ) layers was developed. This process differs from other vapor‐phase deposition methods in that a dc bias circuit, separate from the plasma‐generation circuit, is used for the electrodeposition process. The YSZ layer was electrodeposited from ZrCl4 and YCl3 on a nonporous calcia‐stabilized zirconia substrate. Scanning electron microscopy, electron probe microanalysis, electron spectroscopy for chemical analysis, and x‐ray‐diffraction measurements confirmed the electrodeposition of a smooth, pinhole‐free yttria‐stabilized zirconia film of about 3 μm thickness.