On the chemical vapour deposition of zirconia from ZrCl4H2CO2Ar gas mixture: II. An experimental approach
- 31 May 1987
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 132 (2) , 273-287
- https://doi.org/10.1016/0022-5088(87)90583-2
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- On the chemical vapour deposition of zirconia from ZrCl4H2CO2Ar gas mixtures: I. A thermodynamic approachJournal of the Less Common Metals, 1986
- Boron nitride chemical vapour infiltration of fibrous materials from BCl3NH3H2 or BF3NH3 mixtures: A thermodynamic and experimental approachJournal of the Less Common Metals, 1983
- The effects of reaction parameters on the deposition characteristics in Al2O3 CVDJournal of Vacuum Science & Technology A, 1983
- Effect of partial pressure of the reactant gas on the chemical vapour deposition of Al2O3Thin Solid Films, 1982
- Thermodynamic and Experimental Analysis of Chemical Vapor Deposition of Alumina from AlCl3 ‐ H 2 ‐ CO 2 Gas Phase MixturesJournal of the Electrochemical Society, 1982
- Phase Analysis in Zirconia SystemsJournal of the American Ceramic Society, 1972
- Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2SystemJapanese Journal of Applied Physics, 1972
- Preparation and Properties of Pyrolytic Zirconium Dioxide FilmsJournal of the Electrochemical Society, 1971
- Kinetics of the Water—Gas Equilibrium Reaction. I. The Reaction of Carbon Dioxide with HydrogenThe Journal of Physical Chemistry, 1966
- Kinetics and mechanism of the transition of metastable tetragonal to monoclinic zirconiaTransactions of the Faraday Society, 1965