Control of Surface Film Composition and Orientation with Downstream PECVD of Hexafluoropropylene Oxide
- 6 March 1999
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 11 (4) , 862-864
- https://doi.org/10.1021/cm981081p
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Surface interactions of CF2 radicals during deposition of amorphous fluorocarbon films from CHF3 plasmasJournal of Applied Physics, 1998
- Nanolithography by displacement of catalytic metal clusters using an atomic force microscope tipJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H2 Inductively Coupled rf PlasmasChemistry of Materials, 1997
- Spectroscopic Characterization of Films Obtained in Pulsed Radio-Frequency Plasma Discharges of Fluorocarbon MonomersPublished by American Chemical Society (ACS) ,1993
- Determination of surface structure and orientation of polymerized tetrafluoroethylene films by near-edge x-ray absorption fine structure, x-ray photoelectron spectroscopy, and static secondary ion mass spectrometryLangmuir, 1993
- Molecular control of surface film compositions via pulsed radio-frequency plasma deposition of perfluoropropylene oxideChemistry of Materials, 1991
- Plasma Polymerization of FluorocarbonsPublished by Elsevier ,1990
- Preparation and Characterization of Glow Discharge Fluorocarbon-Type PolymersJournal of Macromolecular Science: Part A - Chemistry, 1976
- Dielectric properties of teflon from room temperature to 314-degrees-C and from frequencies of 10_2 to 10_5 c/sJournal of Research of the National Bureau of Standards, 1953