Reduction of threading dislocations in migration enhanced epitaxy grown GaN with N-polarity by use of AlN multiple interlayer
- 1 September 2001
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 230 (3-4) , 387-391
- https://doi.org/10.1016/s0022-0248(01)01248-9
Abstract
No abstract availableKeywords
Funding Information
- Japan Society for the Promotion of Science (JSPS-RFTF97P00102)
- Ministry of Education, Culture, Sports, Science and Technology (11750296)
This publication has 18 references indexed in Scilit:
- Improvement of Crystal Quality of RF-Plasma-Assisted Molecular Beam Epitaxy Grown Ga-Polarity GaN by High-Temperature Grown AlN Multiple Intermediate LayersJapanese Journal of Applied Physics, 2000
- III–nitrides: Growth, characterization, and propertiesJournal of Applied Physics, 2000
- High-frequency AlGaN/GaN polarization-induced high electron mobility transistors grown by plasma-assisted molecular-beam epitaxyApplied Physics Letters, 1999
- Correlation between Dislocation Density and the Macroscopic Properties of GaN Grown by Metalorganic Vapor Phase EpitaxyJapanese Journal of Applied Physics, 1999
- Rapid evaluation of dislocation densities in n-type GaN films using photoenhanced wet etchingApplied Physics Letters, 1999
- Growth of high mobility GaN by ammonia-molecular beam epitaxyApplied Physics Letters, 1999
- Gallium nitride whiskers formed by selective photoenhanced wet etching of dislocationsApplied Physics Letters, 1998
- Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaNJapanese Journal of Applied Physics, 1998
- Lateral epitaxy of low defect density GaN layers via organometallic vapor phase epitaxyApplied Physics Letters, 1997
- Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase EpitaxyJapanese Journal of Applied Physics, 1997