Noncrystalline silicon dioxide films on silicon: A review
- 1 January 1973
- journal article
- review article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 11 (4) , 309-330
- https://doi.org/10.1016/0022-3093(73)90020-3
Abstract
No abstract availableThis publication has 40 references indexed in Scilit:
- Properties and structure of vitreous silica. IIJournal of Non-Crystalline Solids, 1971
- Properties and structure of vitreous silica. IJournal of Non-Crystalline Solids, 1970
- Structure Analysis of Thermal Oxide Films of Silicon by Electron Diffraction and Infrared AbsorptionJapanese Journal of Applied Physics, 1970
- Kinetics and mechanism of thermal oxidation of silicon with special emphasis on impurity effectsJournal of Physics and Chemistry of Solids, 1969
- Additional bibliography of metal—Insulator—Semiconductor studiesIEEE Transactions on Electron Devices, 1968
- A bibliography of metal-insulator-semiconductor studiesIEEE Transactions on Electron Devices, 1967
- Separation of the Linear and Parabolic Terms in the Steam Oxidation of SiliconIBM Journal of Research and Development, 1966
- On the Rates of Oxidation of Silicon and of Silicon Carbide in Oxygen, and Correlation with Permeability of Silica Glass.Acta Chemica Scandinavica, 1964
- Stabilization of Silicon Surfaces by Thermally Grown Oxides*Bell System Technical Journal, 1959
- Modulation of Conductance of Thin Films of Semi-Conductors by Surface ChargesPhysical Review B, 1948