The Influence of Electrons From the Filament on the Material Properties of Hydrogenated Amorphous Silicon Grown by the Hot-Wire Chemical Vapor Deposition Technique
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Theory of the small photocarrier grating under the application of an electric fieldPhysical Review B, 1991
- Deposition of device quality, low H content amorphous siliconJournal of Applied Physics, 1991