Morphology of ion-plated titanium and aluminum films deposited at various substrate temperatures
- 1 November 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 54 (3) , 317-322
- https://doi.org/10.1016/0040-6090(78)90388-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- The morphology of thick evaporated aluminium films and their purity as determined by proton-induced x-ray analysisThin Solid Films, 1977
- Effect of ion bombardment during deposition on thick metal and ceramic depositsJournal of Vacuum Science and Technology, 1974
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- Influence of condensation temperature on microstructure and tensile properties of titanium sheet produced by high-rate physical vapor deposition processMetallurgical Transactions, 1973
- The Influence of Ion Bombardment on the Microstructure of Thick Deposits Produced by High Rate Physical Vapor Deposition ProcessesJournal of Vacuum Science and Technology, 1972
- Structure Modification by Ion Bombardment during DepositionJournal of Vacuum Science and Technology, 1972