Abstract
ArF (B–X) emission at 193 nm has been studied as a function of pressure in Ar/F2, Ar/NF3, Ne/Ar/F2, and Ne/Ar/NF3 mixtures under long pulse electron-beam excitation. Fluorescence yield, formation yield, as well as apparent quenching rate constants of the ArF* (B) state by Ne, Ar, F2, and NF3 have been measured. While the ArF* formation yield is about the same as per neon or argon excitation produced, highest fluorescence yield is obtained from a Ne/Ar/F2 mixture. Using Ne as the main diluent gas prevents the rapid conversion of ArF* to Ar2F* and Ne itself is a slower quencher of ArF* than Ar.