Planar magnetron sputtering cathode with deposition rate distribution controllability
- 15 October 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 96 (3) , 225-233
- https://doi.org/10.1016/0040-6090(82)90246-2
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Temperature properties of the static induction transistorSolid-State Electronics, 1981