Ultraviolet photosulfidation of III-V compound semiconductors: A new approach to surface passivation

Abstract
A new passivation technique for III‐V compound semiconductors based on ultraviolet photolysis of elemental sulfur vapor has been developed. Photosulfidation produces a greater increase in the photoluminescence intensity from GaAs samples than that produced by conventional (NH4)2S dip treatments and is more photostable than the conventional wet process. X‐ray photoelectron spectroscopy of the photosulfided GaAs surfaces indicate formation of a surface sulfide rather than the disulfide characteristic of the (NH4)2S process.