Universal chemical vapour deposition system for metallurgical coatings
- 1 February 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 100 (3) , 209-218
- https://doi.org/10.1016/0040-6090(83)90278-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Tantalum coating of mild steel at atmospheric pressureThin Solid Films, 1980
- Beschichten nach den CVD‐VerfahrenMaterialwissenschaft und Werkstofftechnik, 1980
- Structural and electrical properties of Ta and Ta nitrides deposited by chemical vapour depositionThin Solid Films, 1974
- Unsere Siemens-Welt: Eine Festschrift zum 125jährigen Bestehen des Hauses SBooks Abroad, 1974