Structural and electrical properties of Ta and Ta nitrides deposited by chemical vapour deposition
- 1 November 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 24 (1) , 157-164
- https://doi.org/10.1016/0040-6090(74)90261-2
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- An X-ray study of β-tantalumJournal of Applied Crystallography, 1973
- X-ray analysis of tantalum films triode-sputtered in argon-oxygen mixturesThin Solid Films, 1973
- Effect of nitrogen on the electrical and structural properties of triode-sputtered tantalum filmsJournal of Applied Physics, 1972
- A new structure of sputtered tantalumThin Solid Films, 1972
- CorrectionsMetallurgical Transactions, 1972
- The temperature coefficient of resistance of bulk Ta2NJournal of the Less Common Metals, 1972
- Structure of Tantalum NitridesJapanese Journal of Applied Physics, 1971
- A NEW STRUCTURE IN TANTALUM THIN FILMSApplied Physics Letters, 1965
- Die Nitride des TantalsZeitschrift für anorganische und allgemeine Chemie, 1954
- An X-Ray Study of the Tantalum-Nitrogen System.Acta Chemica Scandinavica, 1954