The temperature coefficient of resistance of bulk Ta2N
- 29 February 1972
- journal article
- research article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 26 (2) , 313-317
- https://doi.org/10.1016/0022-5088(72)90052-5
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Phase composition and conductivity of sputtered tantalumThin Solid Films, 1970
- Generation and relaxation of lattice vibrations in cadmium sulphideJournal of Physics C: Solid State Physics, 1970
- Preparation, Structure, and Properties of Sputtered, Highly Nitrided Tantalum FilmsJournal of Applied Physics, 1968
- Deposition of Tantalum, Tantalum Oxide, and Tantalum Nitride with Controlled Electrical CharacteristicsJournal of Applied Physics, 1966
- A NEW STRUCTURE IN TANTALUM THIN FILMSApplied Physics Letters, 1965
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964
- The reaction between tantalum and nitrogen at 800–1300°cJournal of the Less Common Metals, 1963
- Electrical Conduction Mechanism in Ultrathin, Evaporated Metal FilmsJournal of Applied Physics, 1962
- Die Nitride des TantalsZeitschrift für anorganische und allgemeine Chemie, 1954
- An X-Ray Study of the Tantalum-Nitrogen System.Acta Chemica Scandinavica, 1954