Determination of the angle of incidence in a Cameca IMS‐4f SIMS instrument
- 1 November 1989
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 14 (11) , 739-743
- https://doi.org/10.1002/sia.740141110
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Suppression of surface topography development in ion‐milling of semiconductorsSurface and Interface Analysis, 1987
- SIMS analysis of AlxGa1-xas/gaas layered structures grown by metal-organic vapour phase EpitaxySurface and Interface Analysis, 1986
- Transient effects in SIMS analysis for different angles of incidence of an O+2 primary ion beamApplications of Surface Science, 1985
- The influence of bombardment conditions upon the sputtering and secondary ion yields of siliconApplications of Surface Science, 1981