Deposits obtained by photolysis of hexamethyldisilane by ArF excimer laser (SiC thin film preparation by ArF excimer laser chemical vapor deposition, Part 2)
- 19 May 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 300 (1-2) , 95-100
- https://doi.org/10.1016/s0040-6090(96)09554-5
Abstract
No abstract availableKeywords
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