Thermal instability of the TiSi2/Si structure: Impurity effects
- 1 January 1990
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 41-42, 290-295
- https://doi.org/10.1016/0169-4332(89)90073-1
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Interfacial reaction-induced morphological instabilities in thin Al/Pt and Al/Pd filmsJournal of Materials Research, 1987
- High Temperature Process Limitation on TiSi2Journal of the Electrochemical Society, 1986
- Thermal stability of TiSi2 on mono- and polycrystalline siliconJournal of Applied Physics, 1986
- Dopant redistribution during titanium silicide formationJournal of Applied Physics, 1986
- Interaction of TiSi2 layers with polycrystalline SiApplied Physics Letters, 1986
- Theory of Thermal GroovingJournal of Applied Physics, 1957