Development of second generation oxygen implanter
- 20 January 1992
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 12 (1-2) , 145-148
- https://doi.org/10.1016/0921-5107(92)90275-e
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- SIMOX devices and circuitsVacuum, 1991
- A high current, high voltage oxygen ion implanterNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- C.M.O.S. devices fabricated on buried SiO 2 layers formed by oxygen implantation into siliconElectronics Letters, 1978