Growth of Co films on Cu(111) studied in real space
- 15 December 1994
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 50 (23) , 17705-17708
- https://doi.org/10.1103/physrevb.50.17705
Abstract
The atomic structure of Co films deposited on Cu(111) at room temperature is studied by imaging backscattered secondary electrons. The patterns show in-registry growth for the first two atomic layers. The next two monolayers show features of the fcc as well as the hcp structure. The hexagonal structure characteristic for bulk Co is found for subsequent layers.Keywords
This publication has 14 references indexed in Scilit:
- Real-space imaging of surfaces by means of backscattered electrons: application to Pt(110)Applied Surface Science, 1994
- Surface etching and enhanced diffusion during the early stages of the growth of Co on Cu(111)Surface Science, 1994
- Scanning-tunneling-microscopy study of the growth of cobalt on Cu(111)Physical Review B, 1993
- Structure of Co films grown on Cu(111) studied by photoelectron diffractionPhysical Review B, 1993
- Growth and structure of Fe and Co thin films on Cu(111), Cu(100), and Cu(110): A comprehensive study of metastable film growthPhysical Review B, 1993
- Structural study of cobalt-copper multilayers by NMRPhysical Review B, 1992
- Nanostructure of Co/Cu multilayersPhysical Review B, 1991
- Coherent fcc stacking in epitaxial Co/Cu superlatticesPhysical Review B, 1989
- Experimental and theoretical study of Co adsorbed at the surface of Cu: Reconstructions, charge-density waves, surface magnetism, and oxygen adsorptionPhysical Review B, 1981
- Transport Properties of the Ferromagnetic Metals. I. CobaltCanadian Journal of Physics, 1973