Photochemical vapor deposition of amorphous silicon through 185 nm excitation of monosilane
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 711-714
- https://doi.org/10.1016/0022-3093(83)90270-3
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Novel Amorphous Silicon Solar Cells Prepared by Photochemical Vapor DepositionJapanese Journal of Applied Physics, 1983
- Control of the Deposition of Silicon Nitride Layers by 2537Å RadiationJournal of the Electrochemical Society, 1972
- Epitaxial Growth with Light IrradiationJapanese Journal of Applied Physics, 1968