The role of argon involved in plasma-deposited amorphous Si:H films
- 29 February 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 475-480
- https://doi.org/10.1016/0022-3093(80)90640-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Effect of annealing on the optical properties of plasma deposited amorphous hydrogenated siliconSolar Energy Materials, 1979
- New Development in the Study of Amorphous Silicon Hydrogen Alloys: The Story of OPhysical Review Letters, 1978
- Preparation of highly photoconductive amorphous silicon by rf sputteringSolid State Communications, 1977
- Use of hydrogenation in structural and electronic studies of gap states in amorphous germaniumPhysical Review B, 1976
- Substitutional doping of amorphous siliconSolid State Communications, 1975