High mobility p-channel germanium MOSFETs with a thin Ge oxynitride gate dielectric
- 25 June 2003
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Strained Si NMOSFETs for high performance CMOS technologyPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Strained Ge channel p-type metal–oxide–semiconductor field-effect transistors grown on Si1−xGex/Si virtual substratesApplied Physics Letters, 2001
- High hole mobility in Si0.17Ge0.83 channel metal–oxide–semiconductor field-effect transistors grown by plasma-enhanced chemical vapor depositionApplied Physics Letters, 2000