Metallization of ceramics for electronic components by magnetron-plasmatron coating
- 1 October 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (2) , 313-326
- https://doi.org/10.1016/0040-6090(80)90013-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Advances in high rate sputtering with magnetron-plasmatron processing and instrumentationThin Solid Films, 1979
- Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide filmsThin Solid Films, 1979
- The role of plasmatron/magnetron systems in physical vapor deposition techniquesThin Solid Films, 1978
- Use of the ring gap plasmatron for high rate sputteringThin Solid Films, 1977