Advances in high rate sputtering with magnetron-plasmatron processing and instrumentation
- 17 December 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 64 (3) , 455-467
- https://doi.org/10.1016/0040-6090(79)90330-4
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- The role of plasmatron/magnetron systems in physical vapor deposition techniquesThin Solid Films, 1978
- Substrate heating in cylindrical magnetron sputtering sourcesThin Solid Films, 1978
- Some features of magnetron sputteringThin Solid Films, 1978
- The characteristics of a modified planar-magnetron sputtering sourceVacuum, 1978
- Self-sputtering phenomena in high-rate coaxial cylindrical magnetron sputteringJournal of Vacuum Science and Technology, 1977
- Properties of rf‐sputtered Al2O3 films deposited by planar magnetronJournal of Vacuum Science and Technology, 1977
- High-rate sputtering of enhanced aluminum mirrorsJournal of Vacuum Science and Technology, 1977
- Use of the ring gap plasmatron for high rate sputteringThin Solid Films, 1977
- High‐rate sputtering of aluminum for metallization of integrated circuitsJournal of Vacuum Science and Technology, 1977
- Magnetic Field Effects on an Abnormal Truncated Glow Discharge and Their Relation to Sputtered Thin-Film GrowthJournal of Applied Physics, 1963