Leaf Water Diffusion Resistance in Clonal Tea (Camellia sinensis L.): Effects of Water Stress, Leaf Age and Clones

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Abstract
Leaf diffusion resistance was influenced by leaf age in well-watered and water-stressed clonal tea plants. In well-watered plants and in two of the three clones studied, young leaves showed a significantly lower diffusion resistance than old leaves. In water-stressed plants young leaves always exhibited a higher diffusion resistance than old leaves. The highest diffusion resistance, irrespective of leaf age and water stress, occurred in clone DN which is known to be the most drought tolerant of the three clones studied, suggesting that drought tolerance in clone DN is caused, at least in part, by a stomatal regulation mechanism. Water release characteristic curves for the three clones indicated differences in the water content-water potential relationship between young and old leaves as well as between clones. The drought tolerant clones had a higher relative water content for a given water potential compared with the drought-susceptible clone.