Optimization of AlGaN films grown by RF atomic nitrogen plasma using in-situ cathodoluminescence
- 1 May 1997
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 175-176, 79-83
- https://doi.org/10.1016/s0022-0248(97)00869-5
Abstract
No abstract availableKeywords
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