Meeting the pattern definition challenge of 256MBit DRAM x-ray masks
- 30 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4) , 153-158
- https://doi.org/10.1016/0167-9317(93)90046-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- E-beam written optically transparent x-ray masks: Four levels for an industrial VLSI chip with megabit design rulesMicroelectronic Engineering, 1992
- Quantitative lithographic performance of proximity correction for electron beam lithographyJournal of Vacuum Science & Technology B, 1990