E-beam written optically transparent x-ray masks: Four levels for an industrial VLSI chip with megabit design rules
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 161-165
- https://doi.org/10.1016/0167-9317(92)90033-n
Abstract
No abstract availableKeywords
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