State of the art of pattern placement accuracy of silicon X-ray master masks
- 1 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 117-120
- https://doi.org/10.1016/0167-9317(89)90027-0
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- X-ray lithographyJournal of Vacuum Science & Technology B, 1988
- High resolution e-beam lithography for X-ray mask makingMicroelectronic Engineering, 1987
- Silicon X-ray masks: Pattern placement and overlay accuracyMicroelectronic Engineering, 1986
- Micromechanics: A silicon microfabrication technologyMicroelectronic Engineering, 1985
- X-Ray Lithography: Can It Be JustifiedPublished by SPIE-Intl Soc Optical Eng ,1985