Procedure and results of mask fabrication via X-ray lithography
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 275-278
- https://doi.org/10.1016/0167-9317(90)90114-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Fabrication of fully scaled 0.5-μm n-type metal–oxide semiconductor test devices using synchrotron x-ray lithography: Overlay, resist processes, and device fabricationJournal of Vacuum Science & Technology B, 1988
- Crirical dimension control in X-ray masks with electroplated gold absorbersMicroelectronic Engineering, 1986