Crirical dimension control in X-ray masks with electroplated gold absorbers
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 73-80
- https://doi.org/10.1016/0167-9317(86)90032-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Synchrotron lithography for sub-half-micron T-Gates in GAAS-FETMicroelectronic Engineering, 1986
- Submicron patterns formed by reactive ion etchingMicroelectronic Engineering, 1985