The influence of titanium nitride sputter deposition temperature on surface-hardened 2.5% silicon iron
- 15 March 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 170 (2) , 293-307
- https://doi.org/10.1016/0040-6090(89)90735-9
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Tribological properties of MoNx coatings in contact with copperJournal of Vacuum Science & Technology A, 1986
- Depth profiling of thin films using a Grimm-type glow discharge lampThin Solid Films, 1985
- L'analyse des surfaces métalliques par spectrométrie d'émission à décharge luminescenteSpectrochimica Acta Part B: Atomic Spectroscopy, 1978
- Glow discharge optical spectroscopy as an analytical depth profiling techniqueJournal of Vacuum Science and Technology, 1975
- Measurement of boron impurity profiles in Si using glow discharge optical spectroscopyApplied Physics Letters, 1974
- Glow-discharge optical spectroscopy for the analysis of thin filmsJournal of Applied Physics, 1973
- In-Depth Compositional Profile Analysis of Alloys Using Optical Emission Glow Discharge SpectrographyApplied Spectroscopy, 1973
- The stylus or scratch method for thin film adhesion measurement: some observations and commentsJournal of Physics D: Applied Physics, 1970
- Eine neue glimmentladungslampe für die optische emissionsspektralanalyseSpectrochimica Acta Part B: Atomic Spectroscopy, 1968
- Some factors influencing the adhesion of films produced by vacuum evaporationJournal de Physique et le Radium, 1950