A comparison of calculated arsenic implantation profiles in silicon with experimental results
- 16 February 1978
- journal article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 45 (2) , K121-K123
- https://doi.org/10.1002/pssa.2210450251
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Die abtragung dünner schichten von P- und B-implantiertem Silizium mit Hilfe der anodischen OxydationThin Solid Films, 1976
- Theoretical Considerations on Lateral Spread of Implanted IonsJapanese Journal of Applied Physics, 1972