Homogeneous lithium fluoride films as a high resolution electron beam resist
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 287-290
- https://doi.org/10.1016/0167-9317(92)90058-y
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Progress in self-developing metal fluoride resistsJournal of Vacuum Science & Technology B, 1987
- Barium fluoride and strontium fluoride negative electron beam resistsJournal of Vacuum Science & Technology B, 1987
- Radiolysis and resolution limits of inorganic halide resistsJournal of Vacuum Science & Technology B, 1985