Characterization of interface electrical properties in SiO2/InSb metal/insulator/semiconductor structures prepared by plasma-enhanced chemical vapour deposition
- 1 April 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 148 (3) , 243-250
- https://doi.org/10.1016/0040-6090(87)90317-8
Abstract
No abstract availableKeywords
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