Applications of in situ SIMS during processing of electronic materials
- 1 July 1988
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 12 (5) , 303-308
- https://doi.org/10.1002/sia.740120506
Abstract
An in situ SIMS system is described that is capable of providing accurate and reliable control in determining the termination of processes whilst etching through multi‐layer structures. The instrumentation is described and how progressive alterations have been implemented to improve the sensitivity. Various applications are described which show the wide range of material systems that have already been addressed.Keywords
This publication has 2 references indexed in Scilit:
- In situ monitoring during ion beam processing of multi-layer epitaxial III-V device structuresSemiconductor Science and Technology, 1987
- Synthetic macromoleculesPublished by Royal Society of Chemistry (RSC) ,1986