Ultrahigh Vacuum Electron Microscope
- 1 December 1968
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 39 (12) , 1806-1811
- https://doi.org/10.1063/1.1683244
Abstract
A Hitachi HU‐11B electron microscope has been modified for ultrahigh vacuum operation. Differential sputter ion pumps are used to evacuate the entire microscope column, which was extensively modified to be compatible with the high vacuum, low contamination environment. Excellent beam stability and resolution have been observed with column pressures as low as 5×10−8 Torr, but the image intensifier has proved unsatisfactory for high resolution readout.This publication has 3 references indexed in Scilit:
- Effects of vacuum environment on the sub-structure of evaporated F.C.C. metal filmsPhilosophical Magazine, 1966
- Transmission electron microscopy of omega phase in a Zr-15 % Nb alloyJournal of Nuclear Materials, 1964
- The origin of specimen contamination in the electron microscopeBritish Journal of Applied Physics, 1953