Direct Nanopatterning of Metal Surfaces Using Self‐Assembled Molecular Films
- 5 March 2004
- journal article
- research article
- Published by Wiley in Advanced Materials
- Vol. 16 (5) , 405-409
- https://doi.org/10.1002/adma.200306190
Abstract
A new method for direct patterning of metal surfaces with sub‐50 nm resolution based on molecular films is described (see Figure). Thermal vapor deposition of different metals on chemically surface‐modified nanostructured silicon or metallic masters allows direct pattern transfer and easy film detachment. Patterned metallic surfaces are also used as platforms to grow nanostructured hybrid materials by controlled chemical reactions.Keywords
This publication has 35 references indexed in Scilit:
- Electrodesorption Potentials of Self-Assembled Alkanethiolate Monolayers on Copper Electrodes. An Experimental and Theoretical StudyThe Journal of Physical Chemistry B, 2003
- Electrodesorption Potentials of Self-Assembled Alkanethiolate Monolayers on Ag(111) and Au(111). An Electrochemical, Scanning Tunneling Microscopy and Density Functional Theory StudyThe Journal of Physical Chemistry B, 2002
- Nanolithography based on patterned metal transfer and its application to organic electronic devicesApplied Physics Letters, 2002
- Ultrahigh density, high-data-rate NEMS-based AFM data storage systemMicroelectronic Engineering, 1999
- Temperature-Promoted Electrodeposition on Thiolate-Modified ElectrodesLangmuir, 1998
- Nanolithography with neutral chromium and helium atomsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Nanofabrication of Small Copper Clusters on Gold(111) Electrodes by a Scanning Tunneling MicroscopeScience, 1997
- Formation and Structure of Self-Assembled MonolayersChemical Reviews, 1996
- Galvanic Copper Deposition on Thiol-Modified Gold ElectrodesLangmuir, 1995
- Ordered Metal Nanohole Arrays Made by a Two-Step Replication of Honeycomb Structures of Anodic AluminaScience, 1995