Nanolithography with neutral chromium and helium atoms
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6) , 2905-2911
- https://doi.org/10.1116/1.589393
Abstract
We describe two experiments that use neutral atomic beam techniques to write nanostructures. In the chromium experiment, we have used neutral chromium atoms to write one- and two-dimensional periodic nanometer-scale structures in a direct way. The periodic structure is given to the atomic beam by a laser light mask. In a second experiment, we have used a self-assemblingmonolayer as a resist for metastable helium atoms in a proximity printing experiment.Keywords
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