In situ measurements of the stress changes in thin-film electrodes
- 1 September 1989
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 22 (9) , 755-757
- https://doi.org/10.1088/0022-3735/22/9/014
Abstract
An optical system with a laser-beam position detector has been used for in situ measurement of the changes of the mechanical stress in thin films during electrochemical reactions. This non-interferometric system can measure stress variations as low as 106 N m-2 with response times better than 1.0 s.Keywords
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